Nanostructured ZnO thin films prepared by pulsed-laser deposition

Abstract

Zinc oxide is a versatile material with excellent optical, electrical and piezoelectrical properties and has been applied to antireflection coatings, transparent electrodes in solar cells, surface acoustic wave devices, pyroelectric devices, gas sensors, varistors and electro- and photoluminescent devices. Nanostructured ZnO thin films can be achieved by pulsed-laser deposition. Key processing parameters of oxygen partial pressure (10−5 –100 Pa) and substrate temperature (200 – 700 °C) have been investigated and correlated with various morphologies of nanostructure. The characterization was made using X-ray diffraction and field emission scanning electron microscope.Zinc oxide is a versatile material with excellent optical, electrical and piezoelectrical properties and has been applied to antireflection coatings, transparent electrodes in solar cells, surface acoustic wave devices, pyroelectric devices, gas sensors, varistors and electro- and photoluminescent devices. Nanostructured ZnO thin films can be achieved by pulsed-laser deposition. Key processing parameters of oxygen partial pressure (10−5 –100 Pa) and substrate temperature (200 – 700 °C) have been investigated and correlated with various morphologies of nanostructure. The characterization was made using X-ray diffraction and field emission scanning electron microscope.