Abstract
Nanostructured magnesium fluoride (MgF2) antireflective films with ultra-high laser induced damage thresholds (LIDTs) have been prepared through dip coating of ~10nm MgF2 nanoparticles on fused silica substrates. The films increase transmittance from 93.0% for bare substrates to 99.98% for coated substrates. The LIDTs of the nanostructured MgF2 films reach as high as 25J/cm2 at 351nm, 34J/cm2 at 527nm and 63J/cm2 at 1053nm, respectively. The LIDTs of the nanostructured MgF2 films is higher than that of dense MgF2 films and sol–gel derived silica films. Such high LIDTs of the nanostructured MgF2 films may be attributed to the large band gap and the quantum size effect of the MgF2 nanoparticles. These nanostructured MgF2 films will be utilized as antireflective films used in high-peak-power laser system.
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