Abstract
The influence of organic contamination (rubber outgassing) on the transmittance of the SiO2 sol‐gel antireflection (AR) film and laser‐induced damage threshold (LIDT) at 355 nm for 3ω AR film and at 1064 nm for 1ω AR film is studied. The correlation between the contamination time and the transmittance loss/LIDT of 1ω/3ω AR film is also investigated both in atmospheric and vacuum environments. The results show that the transmittance loss increases with increasing contamination time, and the LIDT decreases with increasing contamination time for both in atmospheric and vacuum environments. In addition, the resistance against contamination of the 1ω film is stronger than 3ω film, and the contamination is more serious in vacuum than in an atmosphere environment for the same contamination time. Meanwhile, the damage mechanism is also discussed. It indicated that both the porous structure and photo‐thermal absorption contribute to the decreasing LIDT of the sol‐gel AR film.
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