Nanostructured dimethacrylate-based photopolymerizable systems by modification with diblock copolymers

Abstract

We report the full characterization of a photocurable dimethacrylate-based formulation modified with small amounts (1 and 3 wt%) of a polystyrene-block-poly(ethylene oxide) (PS-b-PEO) block copolymer (BCP). The UV curable formulation is a mixture of bisphenol A bis(2-hydroxy-3-methacryloxypropyl)ether (Bis-GMA) and triethylene glycol dimethacrylate (TEGDMA) and contains phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide (Irgacure819) as photoinitiator. We demonstrate that the addition of a small amount of BCP in the uncured formulation is able to induce a phase separation at the nanometer scale. The nanoscale structure formed in the pre-cure stage is retained after the UV curing, so obtaining nanostructured solid cross-linked materials. The studied materials can be used in the manufacturing process of stereolithography and, therefore, in modern 3D printers. The ability to induce and control the formation of nanostructures in the material by adding BCPs in the formulations could open new opportunities to tailor and improve the properties of the 3D printed objects.