Nanosecond pulsed laser etching anti-reflective gratings and synchronous laser annealing for performance optimization of Ag/AZO thin films

Abstract

Nanosecond pulsed laser etching for fabricating anti-reflective gratings and inducing synchronous laser annealing was performed on Ag/AZO films. The optimum grating pitch was determined by performance analyses of laser-etched unidirectional gratings, based on which laser-etched bidirectional gratings were fabricated to further determine the optimum grating tilt angle. The results revealed that with the increase of grating pitch, the grating ridge total-side-area was gradually decreased to cause a gradually weakened anti-reflective effect, but the superimposed heat-affected zones between adjacent grooves became smaller or even disappeared, which brought about different synchronous laser annealing effects. The unidirectional grating-textured film with a medium grating pitch of 200 μm showed the best overall performance under the combined influence from anti-reflective gratings and synchronous laser annealing. For the bidirectional gratings, although increasing the grating tilt angle did not change the grating ridge total-side-area, it would enable the laser energy to be more uniformly distributed on the whole film surface, producing a better synchronous laser annealing effect. The bidirectional grating-textured film with a grating tilt angle of 90° had the best overall performance with the highest FOM value of 2.18 × 10−2 Ω−1 that was ∼3.2 times that of the as-prepared film. The results are instructive for preparing high-performance TCO-based films.