Abstract
The quality of pulsed YAG laser etching of commercially sputtered ITO thin films used for conductive electrodes in electroluminescent (EL) display was compared with chemical etching. A pulsed YAG laser with wavelength λ = 1.06 microm and a maximum power of 5 W was used in the experiments. The etched profiles were measured with an alpha-step profilometer and observed with SEM. The characteristics of the chemical and laser etched ITO thin films are presented. The edges of the chemically etched conductive electrodes are not sharply defined and some unetched areas of ITO thin film reduce the isolating resistance. Melted edges of the ITO films and damage to the glass substrates were characteristics of the lasser etching. The quality of the laser etched conductive electrodes depends on energy, frequency and pulse width of the laser beam.
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