Abstract
The quality of pulsed YAG laser etching of commercially sputtered ITO thin films used for conductive electrodes in electroluminescent (EL) display was compared with chemical etching. A pulsed YAG laser with wavelength λ = 1.06 microm and a maximum power of 5 W was used in the experiments. The etched profiles were measured with an alpha-step profilometer and observed with SEM. The characteristics of the chemical and laser etched ITO thin films are presented. The edges of the chemically etched conductive electrodes are not sharply defined and some unetched areas of ITO thin film reduce the isolating resistance. Melted edges of the ITO films and damage to the glass substrates were characteristics of the lasser etching. The quality of the laser etched conductive electrodes depends on energy, frequency and pulse width of the laser beam.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
