Nanoscale Topographical Fluctuations: A Key Factor for Evaporative Colloidal Self-Assembly.

Abstract

This work investigates the role of surface parameters such as the nanoscale roughness, topography, and skewness of smooth and rough Si surfaces in the shape of patterns left by evaporating colloidal droplets of spherical polystyrene particles. The droplet contact angle, colloidal deposition pattern, crack density, and rim growth velocities are experimentally evaluated for varying roughness. The contact angle and rim growth rate are found to be more for rough surfaces in comparison to smooth ones. Roughness also helps in reducing stress in the drying droplets, thereby impeding the process of crack formation as exemplified by the experimental results. The altered Derjaguin-Landau-Verwey-Overbeek (DLVO) interactions emerging from the contribution of nanoscale roughness are theoretically evaluated for each differently rough substrate-particle combination. The forces have been calculated by considering large- and small-scale roughness parameters of the experimental surfaces. The experimental findings have been duly corroborated by theoretical estimates. Finally, it is observed that the skewness of the surface and the small-scale asperity radius bear a correlation with the DLVO forces and subsequently with the ring deposit pattern. The present understanding of the influence of surface fluctuations on evaporative self-assembly would enable one to choose the right topographic surface for particular applications.