Abstract
We describe a method for measurement of nanoscale shift of interfaces in layered systems by a combination of secondary neutral mass spectrometry and profilometer. We demonstrate it by the example of the investigation of interface shifts during the solid state reaction in Ni/amorphous-Si system. The kinetics of the shrinkage of the initial nanocrystalline Ni film and the amorphous Si layer as well as the average growth kinetics of the product phases were determined at 503 K. The results show that nanoscale resolution can be reached and the method is promising for following solid state reactions in different thin film systems.
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