Abstract

In this chapter, inverted and upright nanopyramid structures with light-harvesting properties and self-cleaning hydrophobic surfaces suitable for solar cells are presented. Periodic nanopyramid structures with 400–700 nm features were fabricated using interference lithography and combined dry and wet etching processes. The inverted nanopyramids (INP) were applied at the front side of the solar cells using UV nanoimprint lithography. These structures provided effective light-trapping properties and led to oblique angle light scattering and a significant reduction in reflectance resulting in higher power conversion efficiency. The second type, the periodic upright nanopyramid (UNP) structures were applied on a glass substrate by UV nanoimprint process. The glass cover is also utilized as a protective encapsulant front layer. The use of the upright nanopyramid structured cover glass in the encapsulated solar cell has also enhanced the power conversion efficiency due to the antireflection and strong light-scattering properties compared to the bare cover glass. In addition, the upright nanopyramid structured cover glass exhibited excellent self-cleaning of dust particles by rolling down water droplets. These results suggest that the nanopyramid structures with light-harvesting and self-cleaning properties can improve the performance of different types of solar cells, including thin films and glass-based PVs.

Highlights

  • Reducing optical losses in the solar cells has always been a key factor in enhancing the conversion efficiency

  • The inverted nanopyramid structures were fabricated on Si substrate by laser interference lithography (LIL) and subsequent pattern transfer process using reactive ion etching followed by KOH wet etching

  • During the first nanoimprint process, the upright nanopyramid structures were fabricated on the glass substrate by simple, high-throughput and low-cost UV-nanoimprint lithography (NIL) using Si master mold with inverted nanopyramid structures

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Summary

Introduction

Reducing optical losses in the solar cells has always been a key factor in enhancing the conversion efficiency. The UV nanoimprint lithography (UV-NIL) is emerging as a powerful technique for fabricating nanoscale structures on large scale surfaces with simple, high-throughput, low-cost and high-resolution manufacturing capability [14] Various nanostructures such as nanowires [15], nanorods [16], nanocones [17], nanopyramids [18], nanopillars [19] and metal nanostructures such as nanogrooves [20] and nanoparticle arrays [21] have been extensively studied. The optical, electrical and wetting properties of the solar cells coated with the inverted nanopyramid (INP) structures are investigated

Fabrication of upright nanopyramid structures on a glass substrate
Solar cell fabrication Monocrystalline
Surface wettability and self-cleaning behaviors
Fabrication of inverted nanopyramid structures by UV-NIL
Surface wettability
Findings
Conclusions
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