Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics.

Jenna Multia,Anish Philip,Dmitry E Kravchenko,Maarit Karppinen,Víctor Rubio-Giménez,Rob Ameloot

doi:10.1021/acsanm.2c04934

Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics.

Jenna Multia, Anish Philip + Show 4 more

Open Access

https://doi.org/10.1021/acsanm.2c04934

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Journal: ACS Applied Nano Materials	Publication Date: Jan 10, 2023
Citations: 7	License type: CC BY 4.0

Affiliation: Aalto University, KU Leuven

#Molecular Layer Deposition #Bulk Metal–organic Framework + Show 8 more

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Abstract

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

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