Abstract
Nanoscale ridge aperture antennas have been shown to have high transmission efficiency and confined nanoscale radiation in the near field region compared with regularly-shaped apertures. The radiation enhancement is attributed to the fundamental electric-magnetic field propagating in the TE(10) mode concentrated in the gap between the ridges. This paper reports experimental demonstration of field enhancement using such ridge antenna apertures in a bowtie shape for the manufacture of nanometer size structures using an NSOM (near field scanning optical microscopy) probe integrated with nanoscale bowtie aperture. Consistent lines with width of 59 nm and as small as 24 nm have be written on photoresist using such probes.
Highlights
Lithography is an essential tool in many areas, most importantly in the fields of manufacturing of micro and nanoelectronics, and like any tool, needs to be continuously upgraded to match pace with demand
Nanoscale ridge aperture antennas have been shown to have high transmission efficiency and confined nanoscale radiation in the near field region compared with regularly-shaped apertures
The radiation enhancement is attributed to the fundamental electric-magnetic field propagating in the TE10 mode concentrated in the gap between the ridges
Summary
Lithography is an essential tool in many areas, most importantly in the fields of manufacturing of micro and nanoelectronics, and like any tool, needs to be continuously upgraded to match pace with demand. Probe lithography has lower cost and can be used with a wider variety of laser systems and substrates than traditional masked photolithography systems. It has been demonstrated both with an aperture [5] and without [6], which gives the system more flexibility to be tailored to the requirements of the user. One of the drawbacks to an aperture based system, like NSOM lithography with a nanoscale circular aperture, is the low transmission efficiency of energy onto the substrate [10]. We report experiments combining the NSOM and femtosecond laser approaches together with the use of ridge apertures for lithography applications
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