Abstract
A numerical calculation of the patch-field distribution across nanopatchwork surfaces has been developed. Results show that the low work-function nanosize zones are intrinsically protected by an electrostatic screen, which is induced by the surrounding area having a higher work function. In presence of an applied field, during field emission, a preferential opening of the surface barrier above the nanopatches induces a field emission array of parallel e-beams whose geometrical distribution is defined by the positions of the nanopatches.
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