Abstract
A new class of Negative Organic Vacuum Electron-beam Resists (NOVER) [1] has been synthesised for invacuum fabrication of devices with dimensions down to 25 nm. Here we report the results of tests of NOVER-1, a dry vacuum resist having gross formula C18H17BrN2O2. NOVER-1 can be applied for fabrication of samples for which regular wet resists cannot be used. Examples are fragile nanostructures fabricated on small substrates such as membranes, whiskers, small wires, etc., and on substrates with surfaces having complicated relief. X-ray lenses and ballistic mesoscopic structures of refractory metals, including epitaxial Nb films, have been fabricated using NOVER-1. The films of NOVER-1 can be used for experiments with low energy exposure using, for example, a Scanning Tunnelling Microscope in the cold emission regime.
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