Abstract

Preface. Electron Beam Lithography. Nanolithography, the Integrated System F.J. Hohn. Electron Beam Resists and Pattern Transfer Methods M. Hatzakis. Nanolithography developed through Electron-Beam-Induced Surface Reaction S. Matsui, Y. Ochiai, M. Baba, H. Watanabe. Direct Writing of Nanoscale Patterns in SiO2 X. Pan, A.N. Broers. Sub-10 nm Electron Beam Lithography: -AIF-Doped Lithium Fluoride as a Resist W. Langheinrich, H. Beneking. Surface Imaging for EB-Nanolithography M. Bottcher, L. Bauch, A. Wolff, W. Hoppner. Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier A. Schmidt, F. Faller, A. Forchel. Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski. Fabrication, Investigation and Manipulation of Artificial Nanostructures A. Menschig, F.E. Prins, G. Lehr, R. Bergmann, J. Hommel, U.A. Griesinger, V. Harle, F. Scholz, H. Schweizer. Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition H.W.P. Koops, M. Rudolph, J. Kretz, M. Weber. Nanolithography Requirements -- an Equipment Manufacturer's View B.A. Wallman, G. Crawley. X-Ray Lithography. X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing H.I. Smith, M.L. Schattenburg. X-Ray Phase Shifting Masks F. Cerrina, J. Xiao, Z.Y. Guo. Fabrication of X-Ray Mask for Nanolithography by EBL M. Gentili. Ion Beam Lithography. Intense Focused Ion Beams for Nanostructurisation S. Kalbitzer, Ch. Wilbertz, Th. Miller. Latest Results Obtained with the Alpha IonProjection Machine W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl, F. Thalinger, H. Loschner, G. Stengl, P. Hudek. STM Lithography. Direct Writing with a Combined STM/SEM System A.L. de Lozanne, W.F. Smith, E.E. Ehrichs. Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope C.R.K. Marrian, F.K. Perkins, S.L. Brandow, T.S. Koloski, E.A. Dobisz, J.M. Calvert. STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide J.A. Dagata. Sub-20 nm Lithographic Patterning with the STM L. Stockman, C. Van Haesendonck, G. Neuttiens, Y. Bruynseraede. Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope I. Heyvaert, E. Osquiguil, C. Van Haesendonck, Y. Bruynseraede. Author Index. Subject Index.

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