Abstract
Thermal nanoimprint lithography (NIL) is presented as an alternative fabrication technique for patterning deoxyribonucleic acid (DNA) biopolymer films for photonic device applications. The techniques and procedures developed for directly imprinting optical waveguide structures on a DNA biopolymer using NIL, bypassing the use of a resist layer and any chemical processing, are outlined here. The fabrication technique was developed with a Nanonex NX-2600 NIL flexible membrane system. Additionally, a process for using a Suss MicroTec ELAN CB6L substrate bonder is discussed as an alternative to commercially available NIL systems.
Highlights
The techniques and procedures developed for directly imprinting optical waveguide structures on a deoxyribonucleic acid (DNA) biopolymer using nanoimprint lithography (NIL), bypassing the use of a resist layer and any chemical processing, are outlined here
The marine-derived deoxyribonucleic acid (DNA) biopolymer has been demonstrated in a wide range of photonic devices, including organic light emitting diodes, organic field effect transistors, and polymer electro-optic (EO) modulators.[1,2,3,4]
Unlike conventional NIL where a thermal resist layer is imprinted as an etch mask,[7,8] the waveguide pattern is directly imprinted into the biopolymer film thereby preventing damage to the material by removing exposure to resists, etchants, and solvents
Summary
Thermal nanoimprint lithography (NIL) is presented as an alternative fabrication technique for patterning deoxyribonucleic acid (DNA) biopolymer films for photonic device applications. The techniques and procedures developed for directly imprinting optical waveguide structures on a DNA biopolymer using NIL, bypassing the use of a resist layer and any chemical processing, are outlined here.
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