Nanoimprint and lift-off process using poly vinyl alcohol

K Nakamatsu,S Matsui,H Tabata,T Ohtake,K Tone

doi:10.1109/imnc.2004.245753

Nanoimprint and lift-off process using poly vinyl alcohol

K Nakamatsu, S Matsui + Show 3 more

https://doi.org/10.1109/imnc.2004.245753

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Publication Date: Jan 1, 2004

Affiliation: Japan Science and Technology Agency, University of Hyogo, Osaka Research Institute of Industrial Science and Technology, Osaka University, Meito Sangyo (Japan)

#Lift-off Process #Poly Vinyl Alcohol + Show 8 more

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Abstract

Nanoimprint lithography(NIL) is a very useful technique to make nanostructure devices with low cost and high throughput. A various resist polymers such as PMMA are used as replicated materials for NL. Recently, Poly Vinyl Alcohol(PVA) has been proposed as a nanoimprint template for high resolution and low cost.') In this paper, we proposed lift-off process using PVA as a replicated material. Conventional lift-off process using PMMA uses acetone as a solvent, while lift-off process using PVA can be used water as a solvent which is an ecological friendly process.

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