Abstract
Self-assembled nanodrill technology based on droplet epitaxy growth was developed to obtain nanoholes on a GaAs(100) surface. In this technology, the gallium droplets act like “electrochemical drills” etching away the GaAs substrate beneath to give rise to nanoholes more than 10nm deep. The driving force of the nanodrill is attributed to the arsenic desorption underneath the gallium droplet at high growth temperatures and Ga-rich condition. This nanodrill technology provides an easy and flexible method to fabricate nanohole templates on GaAs(100) surface and has great potential for developing quantum dots and quantum dot molecules for quantum computation applications.
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