Abstract
We describe tests of a technique to fabricate nanostructures by the evaporation of metal through a stencil mask etched in a suspended silicon nitride membrane. Collimated evaporation through the mask gives metal dots less than 15 nm in diameter and lines 15–20 nm wide. We have investigated the extent of hole clogging and the factors which determine the ultimate resolution of the technique.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have