Abstract
Multilayer zone plates whose outermost zone widths are less than 100 nm have been fabricated. Alternate deposition of Ag and Al layers has been performed using a helicon plasma sputtering technique, in which Ar gas pressure was less than 1×10-3 Torr, which is one order lower than in conventional magnetron sputtering. More than 100 Ag/Al layers were deposited, with the thickness of each layer being monitored and controlled by a computer. The multilayered plane was sliced vertically and thinned after the deposition. The multilayer zone plate combined with a crystal acts as a monochromatizing and focusing device for hard X-rays, i.e., a Bragg-Fresnel lens.
Published Version
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