Abstract
A novel method for processing sub-50 nm structures by using carbon nanotube (CNT) masks and integrating quantum dots (QDs) on patterned polymer substrates has been established. Poly(styrene-alt-maleic anhydride) (PSMa) was prepared by the initiated chemical vapor deposition (iCVD) method, an alternative to spin-on deposition. The sub-50 nm PSMa polymer patterns were prepared by low energy oxygen plasma etching by using CNTs as the masks. The water soluble, amine-functionalized QDs underwent the nucleophilic acyl substitution reaction with the PSMa containing anhydride functional groups. This integration method was designed to incorporate high performance QDs on inexpensive, lightweight flexible substrates.
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