Abstract
Organosilane self-assembled monolayers were photodegradated with VUV light of 172 nm in wavelength, using a VUV-exposure system whose proximity gap between photomask and substrate was filled with ambient air and adjustable at intervals of 1 µm. The following knowledge of photodegradation processes was obtained: (1) a larger proximity gap was more favourable for promoting the photochemical reactions and advanced complete photodegradation of the monolayer; (2) such oxidized products as carboxyl groups appeared in irradiation time of several tens of seconds. Moreover, lamination of the second self-assembled monolayer (SAM) against the photodegradated SAM/Si substrate was conducted. It was possible for any permutation of SAMs to laminate the second SAM onto the SAM's surface photodegradated in activated oxygen atmosphere through the reaction between –COOH radicals and –OCH3 functional groups of organosilane precursors. Also, the conspicuous shift of XPS spectra was observed only in the case of laminating CMPhS-SAM on FAS/Si.
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