Abstract
Abstract Polycrystalline NaF films were grown by e-beam assisted physical evaporation on amorphous silica substrates kept, during film growth, at constant temperatures ranging from 40°C to 400°C. The structural characterization of the films was performed by X-ray diffraction and by scanning electron microscopy. Irradiating the films with a 15 keV electron beam induced the formation of F and F-aggregate colour centres stable at room temperature. Absorption and photoemission measurements were performed and indicated a dependence of coloration on the deposition conditions.
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