Abstract
Fine patterning technology of ITO and Ni on the Cr (Ni/Cr) bilayer film electrode for LCD panel was studied. Hl or HBr solution was found to be the most suitable etching solution for ITO because of small undercutting property.For preferential etching for Ni/Cr double bilayer electrode on ITO, mixed solution of CH3COOH-HNO3-H2SO4 H3PO4 was found to be most suitable for Ni film, while for Cr film, Ce (NO3) 4·2NH4NO3 solution was found most suitable. For Ni etching, HNO3 was the most effective component because it shifted the electrode potential to the nobler direction, resulting in an increased etching rate.
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