ＣＶＤ法による軟鋼板および石英板上へのＶＢ２皮膜の合成

Abstract

Vanadium diboride (VB2) film has been synthesized on mild steel and transparent quartz substrates by CVD method, which was carried out at the temperature range of 1073 to 1223K with the hydrogen reduction of VOCl3-BCl3 mixture under the chemical erquivalent ratio regions of 10 to 40 for H2-VOCl3 gases and of 40 to 120 for H2-BCl3 gases. VB2 film involving both Fe2B and FeB was synthesized on a mild steel substrate because a mild steel plate was borided with BCl3 gas. On the other hand, pure VB2 layer film was prepared on a transparent quartz substrate atthe temperature above 1173K. Futhermore, VB2 film having high orientation and crystallization could not be prepared on a mild steel substrate. However, smooth surface VB2 film having high crystallization and micro-vickers hardness of about 2800Hmv could be synthesized on a transparent quartz substrate at the temperature of 1173K under the conditions of chemical equivalent ratio of 40 for H2-VOCl3 gases and of 80 for H2-BCl3 gases.