Abstract
In this paper, multi-degrees-of-freedom (multi-DOF) system identification of semiconductor exposure apparatus supported by anti-vibration units is discussed. To meet nanometer order semiconductor lithography demands for alignment accuracy, vibration control is one of the most important technologies in the semiconductor exposure apparatus supported by anti-vibration units. A dynamical model of the plant is necessary in order to design the microvibration controller and to evaluate the performance of the control systems. The controlled object is essentially a multivariable system, because the plant has 6-DOF motional modes. All the DOF of the plant are simultaneously excited and the multi-DOF dynamical model is identified from the exciting signals and the vibration output signals. The model is practically constructed in a short time using subspace method in system identification theory. Identification results are evaluated through experimental data in comparison with a conventional frequency response method.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Transactions of the Institute of Systems, Control and Information Engineers
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
