Abstract

Surface ice and frost cause significant safety issues and economic damage. Therefore, the development of films with photothermal properties that can actively de-ice surfaces has gained considerable interest. In this study, a magnetron sputtering system was employed to prepare Cr–Al–C films at room temperature, 250 °C, and 400 °C (denoted as CACrt, CAC250°C, and CAC400°C, respectively). In contrast to CACrt and CAC250°C, CAC400°C has a typical island-like morphology and a multiphase structure composed of (Cr, Al)2Cx, Cr2AlC, and amorphous phases. Furthermore, CAC400°C exhibits a high photothermal performance under near-infrared (NIR) irradiation, which is attributed to its metallic conductivity and broad absorption bands. An ice layer on the CAC400°C surface can be entirely delaminated within 10 s on NIR irradiation, which is significantly faster than that on the CACrt and CAC250°C films. This study demonstrates the considerable potential for the fabrication of Cr–Al–C films and promotes the development of photothermal materials for active de-icing applications.

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