Abstract
We propose a novel, to the best of our knowledge, technique for magnetoplasmonic nanostructures fabrication based on the pulse force nanolithography method. It allows one to create the high-quality magnetoplasmonic nanostructures that have lower total losses than the gratings made by the electron-beam lithography. The method provides control of the surface plasmon polaritons excitation efficiency by varying the grating parameters such as the scratching depth or the number of scratches in a single period. The quality of the plasmonic gratings was estimated by means of the transverse magneto-optical Kerr effect that is extremely sensitive to the finesse of a plasmonic structure.
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