Multilayered 3-D Optical Circuit With Mirror-Embedded Waveguide Films

Abstract

A multilayered 3-D optical circuit is fabricated using mirror-embedded waveguide films that have optical input-output apertures on their surfaces. We fabricated the surface input-output optical waveguide films via an ultraviolet imprint method using a mirror-integrated master. To fabricate the master, waveguide patterns were formed on a silicon wafer using a deep reactive ion etching method, and 45°-angled mirror structures were then constructed on the waveguide core patterns via a V-sawing technique. We subsequently manufactured a multilayered optical circuit layer by layer, before measuring its optical characteristics. The input beam inserted onto the surface of the circuit was emitted through 2 × 2 arrayed surface output apertures after propagating along the 3-D beam path.