Abstract
Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro- and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.
Highlights
Nothing has had a greater impact on our daily lives than microelectronics
Perhaps the most documented application of multi-beam interference (MBI) and multi-beam interference lithography (MBIL) has been in the formation of photonic crystal (PC) structures and is the subject of more than half of the references included in this review
By utilizing the subwavelength periodic patterns produced by MBIL, numerous important structures can be realized for an increasing number of subwavelength structure applications, including synthesized-index elements, form-birefringent polarization elements, guided-mode resonant elements [226], field-emission devices, plasmonic structures, surface texturing, magnetic nanostructures, and numerous other nanotechnology efforts
Summary
Nothing has had a greater impact on our daily lives than microelectronics. The semiconductor revolution is the engine that drives cell phones, the internet, flat-panel televisions, flash memory chips, global positioning system devices, solar cells, etc. Techniques being considered include (1) self-assembly approaches; (2) construction-based approaches including immersion lithography, double patterning, two-photon lithography, printing, direct writing, mask optimization, and micromanipulation; and, (3) interference lithography [2,3,4,5]. Among these approaches, multi-beam interference lithography (MBIL), sometimes referred to in the literature as “holographic” or “interferometric” lithography, has emerged as a promising technology for relatively simple, subwavelength, and cost-effective periodic patterning in one, two and even three dimensions. The present work complements these papers, providing a review of the advances in MBI and MBIL and their use in nano-electronics, followed by a unified, comprehensive discussion of other current applications
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
