Abstract
Porous SiO2 film has been widely studied due to its extensive applications in many fields. This paper presents a newly produced porous SiO2 film made by traditional sol–gel method. Bare Si and Si with SiO2 buffer layer were used as substrate. The SiO2 buffer layer was 500 nm in thickness and was grown by thermal oxidization. The structural properties of SiO2 aerogel films spin-coated on both materials were observed by optical microscope (OM) and scanning electron microscope (SEM). Results reveal that the surface of SiO2 aerogel films on bare Si is rough and discontinuous. While flat and smooth surface is observed on sample with SiO2 buffer layer. This indicates that by inserting SiO2 buffer layer, the structural property of SiO2 aerogel film deposited on Si is improved.
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