Monte Carlo simulation for laser excition processes

Abstract

Two types of Monte Carlo simulation programs for electron-beam excitation processes for a gaseous laser have been developed. One of them : type (A) was used for studying spatial distribution and uniformity of the energy deposition of the electron-beam inside the laser gas. Also the efficiency for energy deposition have been obtaind. E-beam excitation of laser gas from one side results in very nonuniform spatial excitation. Whereas uniform energy deposition is obtained by two-sides excitation or cylindrical excitation.The other program : type (B) treats individual processes of excitations, ionizations, and trajectories of secondary electrons. The average energy to produce an electron-ion pair for argon was determined to be 26.5 eV and 26.9 eV for incidence electron energy of5 keV and 50 keV respectively. For the electron-beam excited KrF laser, the upper laser level is formed about 72% via ions and 28% via excited states.