Abstract
A Monte Carlo type simulation of electron interaction in a shaped electron beam lithography system has been developed. The simulation has been used to model a shaped beam system using Köhler illumination, and shows correct imaging when electron interaction is neglected. The loss of resolution due to interaction is demonstrated, and it is proposed that this technique may be used for the quantitive assessment of the effects on interaction in shaped beam systems.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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