Abstract
We present the design, simulation, fabrication and characterization of monolithically integrated high resistivity p-type boron-diffused silicon two-zone heaters in a model high temperature microreactor intended for nanoparticle fabrication. We used a finite element method for simulations of the heaters’ operation and performance. Our experimental model reactor structure consisted of a silicon wafer anodically bonded to a Pyrex glass wafer with an isotropically etched serpentine microchannels network. We fabricated two separate spiral heaters with different temperatures, mutually thermally isolated by barrier apertures etched throughout the silicon wafer. The heaters were characterized by electric measurements and by infrared thermal vision. The obtained results show that our proposed procedure for the heater fabrication is robust, stable and controllable, with a decreased sensitivity to random variations of fabrication process parameters. Compared to metallic or polysilicon heaters typically integrated into microreactors, our approach offers improved control over heater characteristics through adjustment of the Boron doping level and profile. Our microreactor is intended to produce titanium dioxide nanoparticles, but it could be also used to fabricate nanoparticles in different materials as well, with various parameters and geometries. Our method can be generally applied to other high-temperature microsystems.
Highlights
Microreactors are microfluidic systems in which chemical reactions are performed in a controlled manner within a network of microchannels whose widths and depths range from tens to hundreds of micrometers
We present here our results on the design, simulation, fabrication and thermal characterization of the two heaters monolithically integrated by boron diffusion into a single crystalline silicon wafer and built into a model high temperature Pyrex–silicon microreactor with a thermal barrier aperture array between them
We presented design, simulation, fabrication and characterization of novel p-type boron diffused monolithically integrated heaters in the single crystalline silicon wafer of a model high-temperature microreactor for the synthesis of TiO2 nanoparticles
Summary
Microreactors are microfluidic systems in which chemical reactions are performed in a controlled manner within a network of microchannels whose widths and depths range from tens to hundreds of micrometers. Erdem and coauthors [27] designed a silicon microreactor with Pyrex glass as a microchannel lid for the synthesis of TiO2 with different zones heated at different temperatures. We consider two p-type (boron) diffused spiral-shaped heaters monolithically integrated into the Si wafer of a model microreactor fabricated by the well-known method of anodic bonding of silicon with Pyrex glass. We present here our results on the design, simulation, fabrication and thermal characterization of the two heaters monolithically integrated by boron diffusion into a single crystalline silicon wafer and built into a model high temperature Pyrex–silicon microreactor with a thermal barrier aperture array between them
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