Monolithically Integrated Active Passive Waveguide Array Fabricated on Thin Film Lithium Niobate Using a Single Continuous Photolithography Process (Laser Photonics Rev. 17(4)/2023)

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High Performance Multifunctional Photonic Chip In article number 2200686, Zhiwei Fang, Ya Cheng, and colleagues demonstrate a robust low-loss optical interface by tiling undoped TFLN and rare earth ions doped TFLN substrates for monolithic integration of passive/active lithium niobate photonics. The interface loss is 0.26 dB; this robust low-loss optical interface for passive/active photonic integration will facilitate large-scale high performance multifunctional photonic chip.