Abstract
The characteristics of microhollow dielectric barrier discharge devices in a thin monolithic planar structure with many holes were analyzed regarding the production of OH radicals, using optical emission and laser-induced fluorescence (LIF) spectroscopy techniques. Spatial distributions of OH radical density depended on the diameter of electrode holes from 0.6 to 1.5 mm and the discharge operating gas species. Apparent emission intensity from OH radicals and the LIF signals were very high in He and Ar gases but quite low in N2. However, taking into account the LIF quenching rate in each gas, the existing densities of OH radicals in all tested gases were not greatly different from each other. The absolute density of OH radicals estimated by a comparison of the LIF intensity with our measured result on a conventional He plasma jet referring to reported densities in similar situations was on the order of 1014 cm−3.
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