Abstract
Ge thin-film growth from cluster beams has been investigated withmolecular-dynamics simulations utilizing the Stillinger-Weber two- andthree-body interaction potentials. The spreading of Ge-atom clusters and thestructure of grown films have been studied as a function of incident clustervelocity. Higher surface diffusion and spreading of the deposited clusterswere achieved with a moderate cluster velocity. The epitaxial Ge (111) growthwas obtained under this cluster velocity.
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More From: Modelling and Simulation in Materials Science and Engineering
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