Molecular beam epitaxial growth of GaSb/GaAs quantum dots on Ge substrates

Abstract

We perform structural and optical investigations of GaSb/GaAs quantum dots (QDs) grown on Ge (001) substrates by molecular beam epitaxy. Anti-phase domains (APDs) of GaAs are distributed on Ge substrate after the growth of GaAs due to the growth nature of III–V compound on group IV semiconductors having polar and non-polar behaviors. The APDs affect the QD growth as demonstrated by the growth of conventional InAs QDs on this surface. For GaSb QDs, the GaSb layer is grown on GaAs APD surface and compared with the GaSb layer on conventional (001) GaAs surface. Self-assembled QDs are formed on both surfaces but structural analysis reveals evidence of shape and size differences, which is attributed to the influence of the initial surface. Photoluminescence of GaSb/GaAs QDs grown on both Ge and GaAs substrates is studied. Emission from GaSb/GaAs QDs on Ge substrate can be detected till near room temperature (270K).