Abstract
Optical lithography with high numerical aperture has a significant modulation effect on the polarization state of the light field, which affects the imaging quality of the system. Due to the selectivity of the optical system to the polarization state, incident different polarized light fields will change the imaging quality of the system. Therefore, studying the influence of the lithography system on the polarized light field is helpful to improve the imaging quality. The polarization effect of lithography system is calculated based on polarization ray tracing method in this paper. The polarization state changes of incident scalar light field and vector light field are analyzed, and the ellipticity and azimuth on the exit pupil of system is calculated.
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