Abstract

Optical lithography with high numerical aperture has a significant modulation effect on the polarization state of the light field, which affects the imaging quality of the system. Due to the selectivity of the optical system to the polarization state, incident different polarized light fields will change the imaging quality of the system. Therefore, studying the influence of the lithography system on the polarized light field is helpful to improve the imaging quality. The polarization effect of lithography system is calculated based on polarization ray tracing method in this paper. The polarization state changes of incident scalar light field and vector light field are analyzed, and the ellipticity and azimuth on the exit pupil of system is calculated.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.