Abstract
Ti thin films were deposited on the AlN substrates by direct-current magnetron sputtering at temperatures ranging from room temperature to 450 °C. The size of columnar crystals of Ti films first decreases and then increases, the preferred orientation plane gradually changes from the (100) plane to the (110) plane and then to (101) plane, with the increasing of the substrate temperature. And significant changes in the size of the columnar crystals are accompanied by changes in the preferred orientation plane. An improved Thornton model was proposed, the formation of the initial island, preferred growth and migration of deposited atoms act together to form columnar crystals of the Ti thin film.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
