Abstract
Cr2O3 is used for many applications due to its excellent properties, such as its chemical stability, and strong ionic bonds. However, monolithic Cr2O3 coatings are very difficult to synthesize because the Cr partly oxidizes to higher valence Cr ions. Therefore, ultra-high vacuum conditions were used to enhance the content of the Cr2O3 phase. Nonetheless, the sublimation of elemental Cr is still a challenge under vacuum conditions, which leads to the formation of wrinkles on the coating surface. To address these problems, the Y ions were introduced to pin the outward diffusion of Cr ions for the reason that the atomic radius of Y3+ is larger than that of Cr3+. A Cr-Y coating was successfully prepared on the substrate using pulse plating and ion beam implantation. The influence of different implantation doses was comprehensively analyzed and compared. XPS results showed that the content of Cr2O3 was approximately 87.2 at.%. Furthermore, elemental mapping results showed that the Cr coating with an implantation dose of 5 × 1016 ion/cm2 of Y ions effectively decreased the number of cavities. This work provides a new approach to promote the formation of near-stoichiometric Cr2O3 and enhance its interface strength.
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