Abstract
ABSTRACTA modified line-of-sight model for transport and deposition during LPCVD is used to predict step coverage and film composition uniformity of tungsten silicide barrier layers. Predictions are compared with experimental results for 2 μim wide by 6 μm deep trenches with barrier layers of 0.2 μm nominal thickness. Model predictions are in quantitative agreement with those of a diffusion-reaction model and are in qualitative agreement with experiment.
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