Abstract
We have investigated modification of WNOx films (thickness of 20–80 nm) by D and H ions with the energy of ~1 keV, where D and H ions are retained within the film and compared with the results by medium-energy and high-energy (~1 MeV/u) ion irradiation. WNOx films are prepared on C-plane-cut-sapphire (C-Al2O3) substrate. The composition x is determined to be ~0.4 and the film thickness by Rutherford backscattering spectroscopy (RBS) of He+ ions. X-ray diffraction with Cu- Kα radiation (XRD) is employed to study structural modification. We find monotonic decrease of the XRD intensity with D and H ion fluence, and lattice expansion and compaction for low and high D fluence, respectively. D and H retention is measured by nuclear reaction analysis (NRA) using 15N and 3He ion beams, and elastic recoil detection (ERD). It is discussed whether effects of energy deposition by ions can be separated from inclusion effects of D and H.
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