Abstract
The formation of a topological structure in thin films of the high-temperature superconductor YBa2Cu3O7–δ (YBCO) using ion implantation is studied. The crystal structure and electrical properties of the initial film and the formed insulating regions are investigated. The critical temperature and critical current are measured for microbridges with a width of 3–50 μm fabricated by ion implantation. The results indicate the effectiveness of the ion-implantation method for manufacturing topological structures in YBCO films.
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