Abstract
Mo/Si multilayer (ML) coatings are widely used as reflective coatings of XUV optics, particularly — mirrors and photomasks in EUV (13.5 nm) lithography. Therefore, the problem of controllable change of optical properties of such coatings, first of all — reflectivity in EUV spectral field without coating surface damage is important for some applications in EUV lithography like black border formation [1] and critical dimensions control [2].
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