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Abstract
Several of the more popular analytical methods suitable for solid surfaces and thin films are described, viz, Auger electron spectroscopy, X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and low and high energy ion scattering. The principle underlying each method is explained, and their main features are discussed with respect to qualitative and quantitative analyses, detection limits, lateral and depth resolution, chemical and structural information, insulator specimens, and sample alteration and destruction.
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