Abstract
In this paper, a method for determination of the temperature response of a multilayer structure for excitation in beam displacement modulation (BDM) mode is presented. The main aim of the research was to analyse the dependence of the temperature response on the increase of thermal impedance on the boundary of two layers. A two-dimensional thermal model of a multilayer structure was applied. The model is based on the electrical analogy of thermal processes and it utilises the transmission line matrix (TLM) method. Detailed description of the model is presented. Computations were carried out for the model of high-power thyristor structure (silicon-aluminium-molybdenum). The influence of various parameters of the structure and the measurement setup on the determined temperature response was investigated. It was shown that detection of a delamination is possible even if a temperature detector is shifted in relation to the area of power excitation. Results obtained can be used to optimise parameters of a thermal wave microscope operating in the BDM mode.
Published Version
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