Modelling and simulation of a massively parallelised multi‐photon polymerization 3D microfabrication process

Abstract

While additive manufacturing based on multi photon polymerization is currently considered to be a very promising technique for the fabrication of 3D micro and nano structures, long fabrication times are a major limitation of this approach. Parallelization of the fabrication process is an important technique to overcome this issue. The fabrication process is parallelized by imaging a 1920x1080 pixel Spatial Light Modulator (SLM) into an ultra‐sensitive Triplet‐Triplet Annihilation (TTA) resist. However, proximity effects between close pixels generate uncontrolled polymerization and make the controlled fabrication of 3D structures difficult. This work models light propagation and chemical interactions in our system to predict fabricated structures with a view to precompensating plot data and improving 3D resolution by performing optical and chemical proximity correction. Our simple model gives reasonable predictions of fabricated structures helping us fabricate fully 3D structures in parallel.This article is protected by copyright. All rights reserved.