Abstract
In this paper, we present a simulation of chemical vapor deposition with metallic bipolar plates. In chemical vapor deposition, a delicate optimization between temperature, pressure and plasma power is important to obtain homogeneous deposition. The aim is to reduce the number of real-life experiments in a given CVD plasma reactor. Based on the large physical parameter space, there are a hugh number of possible experiments. A detailed study of the physical experiments in a CVD plasma reactor allows to reduce the problem to an approximate mathematical model, which is the underlying transport-reaction model. Significant regions of the CVD apparatus are approximated and physical parameters are transferred to the mathematical parameters. Such an approximation reduces the mathematical parameter space to a realistic number of numerical experiments. The numerical results are discussed with physical experiments to give a valid model for the assumed growth and we could reduce expensive physical experiments.
Highlights
We present a simulation of chemical vapor deposition with metallic bipolar plates
We motivate our study by simulating the growth of a thin film by PE-CVD plasmaenhanced chemical vapor deposition processes; see 1, 2
Based on the different scales of physical and mathematical experiments, we apply a parameter approximation to fit the physical experiment to the mathematical experiment
Summary
We motivate our study by simulating the growth of a thin film by PE-CVD plasmaenhanced chemical vapor deposition processes; see 1, 2. Based on a large physical parameter space, the number of possible experiments involves at least the variation of all possible parameters Such a large number of experiments can be reduced with the help of numerical experiments based on a mathematical model. The plasma reactor chamber of an NIST GEC reference cell is used and for the hybrid ICP/CCP-RF plasma source, a double spiral antenna is used; see 8 Such experiments are important but the variation of all possible parameters is very extensive. Based on the smaller mathematical parameter space, we can allow much more experiments and obtain via the regression function the resulting parameters to the physical experiments Such switching between numerical experiments and physical experiments reduces the experiments to a possible amount and we can optimize the deposition process.
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