Abstract
Thin-film lithium niobate is an attractive integrated photonics platform due to its low optical loss and favorable optical nonlinear and electro-optic properties. However, in applications such as second harmonic generation, frequency comb generation, and microwave-to-optics conversion, the device performance is strongly impeded by the photorefractive effect inherent in thin-film lithium niobate. In this paper, we show that the dielectric cladding on a lithium niobate microring resonator has a significant influence on the photorefractive effect. By removing the dielectric cladding layer, the photorefractive effect in lithium niobate ring resonators can be effectively mitigated. Our work presents a reliable approach to control the photorefractive effect on thin-film lithium niobate and will further advance the performance of integrated classical and quantum photonic devices based on thin-film lithium niobate.
Highlights
As one of the most widely used synthetic crystals, lithium niobate (LN) has played a critical role in modern telecommunication due to its favorable electro-optic and optical (2) nonlinearity as well as broad optical transparency window [1,2,3,4]
With recent development on nanofabrication technique, low-loss waveguides and high-quality microresonator have been demonstrated on monolithic thin-film lithium niobate on insulator (LNOI) material system [7], providing a promising on-chip platform for second harmonic generation (SHG) [8, 9], frequency comb generation [10,11,12], and electro-optic modulation [13]
We study the impact of dielectric cladding and the following heat treatment on the PR effect of thin-film LNOI microring resonators
Summary
As one of the most widely used synthetic crystals, lithium niobate (LN) has played a critical role in modern telecommunication due to its favorable electro-optic and optical (2) nonlinearity as well as broad optical transparency window [1,2,3,4]. With recent development on nanofabrication technique, low-loss waveguides and high-quality microresonator have been demonstrated on monolithic thin-film lithium niobate on insulator (LNOI) material system [7], providing a promising on-chip platform for second harmonic generation (SHG) [8, 9], frequency comb generation [10,11,12], and electro-optic modulation [13] In many of these applications, the performance and power handling of devices fabricated on the LN platform have been strongly limited by photorefractive (PR) effect [8, 14].
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