Abstract
We present a model for hot carrier transport which is implemented in the device simulator MINIMOS 3. A brief resume of the model is given. We present various results which were calculated with this new model. We show that the I-V characteristics of a MOSFET can be calculated from L eff = 10 µm down to L eff = 0.9 µm with one parameter set. Modifications of carrier and current distributions are presented that show how hot carrier effects tend to smooth these distributions. Implications are discussed how a self-consistent carrier temperature can be used to model impact ionization and oxide injection.
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